Design, fabrication and characterization of MoS₂ self-lubricating pure MoS₂ Coatings for space applications using PVD magnetron sputtering

Deposition of Multilayer Optical Coatings Using Closed Field Magnetron Sputtering

Closed field” magnetron (CFM) sputtering offers a flexible and high throughput deposition process for optical coatings and thin films required in display technologies. CFM sputtering uses two or more different metal targets to deposit multilayers comprising a wide range of dielectrics, metals and conductive oxides. Moreover, CFM provides a room temperature deposition process with high ion curre...

Synthesis and characterization of La2NiO4+δ coatings deposited by reactive magnetron sputtering using plasma emission monitoring

Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering

access at Springerlink.com ABSTRACT B4C coatings for B-based neutron detector applications were deposited using high-power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) processes. The coatings were deposited on Si(001) as well as on flat and macrostructured (grooved) Al blades in an industrial coating unit using B4C compound targets in Ar. The HiPIMS and D...

Silicon Nitride Based Coatings Grown by Reactive Magnetron Sputtering

Silicon nitride and silicon nitride-based ceramics have several favorable material properties, such as high hardness and good wear resistance, which makes them important materials for the coating industry. This thesis focuses the synthesis of silicon nitride, silicon oxynitride, and silicon carbonitride thin films by reactive magnetron sputtering. The films were characterized based on their che...

CrN–Ag self-lubricating hard coatings

CrN–Ag composite films, 2.5–4 Am thick, were deposited by reactive magnetron sputtering on Si and stainless steel substrates in a 0.4 Pa pure nitrogen atmosphere at 500 -C. The layer composition was controlled by the relative power to 7.5-cm-diameter Ag and Cr targets to be 0, 3, 12, and 22 at.% Ag. The layers exhibit a dense columnar microstructure where the Ag is homogeneously distributed in ...